Abstract
We report the effect of both miscut angle (α) and miscut direction (β) of vicinal substrates on the epitaxial growth and domain structure of isotropic metallic oxide SrRuO3 thin films. The thin films have been grown on vicinal (001) SrTiO3 substrates with α up to 4.1° and β up to 37° away from the in-plane [010] axis. Single-crystal epitaxial (110)o SrRuO3 thin films were obtained on vicinal SrTiO3 substrates with a large miscut angle (α=1.9°, 2.1°, and 4.1°) and miscut direction close to the [010] axis. Decreasing the substrate miscut angle or aligning the miscut direction close to the [110] axis (β=45°) resulted in an increase of 90° domains in the plane. The films grown on vicinal substrates displayed a significant improvement in crystalline quality and in-plane epitaxial alignment as compared to the films grown on exact (001) SrTiO3 substrates. Atomic force microscopy revealed that the growth mechanism changed from two-dimensional nucleation to step flow growth as the miscut angle increased.
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