Abstract
Contrast modified room-temperature imprinting that can enhance the penetration depth of pattern, lower the applied pressure, and enable complete removal of the residual layer in the pattern window is developed. It is based on the contrast modification of the intensity of the light illuminated on the imprinted pattern. The contrast modification is made possible by the induction of intensity contrast that is caused by the total internal reflection of the light impinging on the slightly imprinted pattern structure. A condition for successful pattern formation is established through a simple geometric model and experimental results.
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