Abstract
The fabrication of DFB gratings containing slightest variations of the grating pitches (chirped gratings) by means of direct write electron-beam lithography is presented. The procedure allows to generate pitch variations in the pm range, which is required for the realisation of chirped gratings. By use of this technology we are able to realise almost every pitch sequel, that can be expressed analytically. This paper will show the technology to generate chirped gratings by use of a standard electron-beam lithography system. The focus on this technology was not to realise the pitch variations precisely, but rather to give a general fabrication technology for chirped gratings.
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