Constitutive Parameter Optimization Method of Obliquely Incident Reflectivity for Conformal PML

Abstract

The conformal perfectly matched layer (PML), i.e., an efficient absorbing boundary condition, is commonly employed to address the open-field scattering problem of electromagnetic wave. To develope a conformal PML exhibiting a significant absorption effect and small reflection error, the present study proposes the constitutive parameter optimization method of obliquely incident reflectivity in terms of the conformal PML. First, the recurrence formula of obliquely incident reflectivity is desired. Subsequently, by the sensitivity analysis of constitutive parameters, the major optimal design variables are determined for the conformal PML. Lastly, with the reflectivity of the conformal PML as the optimization target, this study adopts the genetic algorithm (GA), simulated annealing algorithm (SA) and particle swarm optimization algorithm (PSO) to optimize the constitutive parameters of the conformal PML. As revealed from the results, the optimization method is capable of significantly reducing the reflection error and applying to the parameter design of conformal PML.