Abstract

To achieve the modification of photonic band structures and realize the dispersion control toward functional photonic devices, composites of photonic crystal templates with high-refractive-index material are fabricated. A two-step process is used: 3D polymeric woodpile templates are fabricated by a direct laser writing method followed by chemical vapor deposition of MoS2. We observed red-shifts of partial bandgaps at the near-infrared region when the thickness of deposited MoS2 films increases. A ∼10 nm red-shift of fundamental and high-order bandgap is measured after each 1 nm MoS2 thin film deposition and confirmed by simulations and optical measurements using an angle-resolved Fourier imaging spectroscopy system.

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