Abstract

During the initial growth, Si(001) surfaces were covered by thin Ge wetting layers. At the wetting layer surfaces, Ge atoms were reconstructed into dimers, which were aligned along the [110] direction to form one-dimensional (1D) ‘dimer rows’. In addition, the dimer rows were partitioned by dimer vacancy lines at the Ge/Si(001) surfaces. As a result, the surfaces were covered spontaneously by an array of 1D dimer row segments. Scanning tunneling microscope images demonstrated that the 1D free-electrons in the dimer rows are confined in each segment and form an ultra-high density array of 1D quantum wells at the surfaces.

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