Abstract
A conductive organic film, ammonium poly(p-styrene sulfonate) (AmPSS) and conductive two-layer resist systems using AmPSS are described. Conductive two-layer resist systems consist of silicon-containing negative resist (SNR) (Toyo Soda) as the top imaging layer and AmPSS as the conductive bottom layer. SNR/AmPSS two-layer resist systems eliminate the charging effects in electron beam lithography.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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