Abstract
Highly conducting Ti1−xNbxO2 thin films have been grown on glass substrates from TiCl4, Nb(OEt)5 and H2O with an atomic layer deposition (ALD) technique. The films become electrically conducting and crystallize with the anatase structure upon a reductive post-deposition annealing. A highly c-axis oriented Ti0.75Nb0.25O2 film exhibits room-temperature resistivity as low as 1.4×10−3Ωcm. The charge carrier density and electron mobility, as estimated from Seebeck and resistivity measurements, are 0.21–1.1×1021cm−3 and 4.2–22cm2/Vs, respectively. The electrical properties of the ALD-fabricated Nb-doped anatase films are comparable with those of sputter-deposited polycrystalline films on glass.
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