Abstract
Atomic layer deposition (ALD) technique is a thin film deposition method that provides highly conformal films on 3D structured supports, including powder materials. The technique relies on sequential self-limiting gas-to-surface reactions which enable control of thin film depositions even down to the atomic level on complex surface geometries. Even if ALD technique has been used in the semiconductor industry in production scale for several years now, there are rather few reports on ALD of battery materials. However, the recent development in processes for lithium containing films clearly opens up new possibilities. Promising applications of ALD include 3D structured all-solid-state batteries and surface modification of electrode powders. The present paper presents an overview of the present status in application of ALD in the field of lithium ion batteries.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
