Abstract
We have developed a concurrent x-ray diffractometer that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into stripe on a substrate and the diffracted beam is detected with a two-dimensional x-ray detector. The obtained snapshot image represents a mapping of XRD intensity with the axes of the diffraction angle and the position in the sample. In addition to the parallel XRD measurements of thin films with various compositions and structures, two-dimensional spatial mapping of XRD peak with a resolution of ∼100 μm is demonstrated. This technique will provide us a high throughput characterization method of various devices composed of epitaxial films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
