Computer Simulation of Abnormal Glow Discharge in Inverse Magnetron Sputtering Systems with Sectioned Cathode Units

Abstract

AbstractA brief review of methods for the formation of coatings from high-entropy alloys is presented. It is concluded that the multi-target co-deposition method is promising for the formation of coatings from high-entropy alloys. The advantage of inverted magnetron sputtering systems with sectioned cathode units developed at the National Aerospace University “Kharkiv Aviation Institute” over the currently used technological ion-plasma generators of the coating material flow for the formation of coatings from high-entropy alloys is shown. It is concluded that it is necessary to develop a mathematical model that allows one to calculate the operating parameters of the sputtering system. These parameters are to be known to obtain coatings of a given composition and thickness. It is mentioned that to solve this problem, first of all, a method was developed for calculating the distribution of local plasma parameters in the discharge gap of an inverse magnetron sputtering system with sectioned cathode nodes and axial plasma flows. When constructing a model of the investigated sputtering system, a fluid plasma model was used. Further, using the proposed model, the current-voltage characteristics of the investigated sputtering systems were obtained. They were compared with experimental data. The character of the calculated and experimental volt-ampere characteristics is the same. Based on comparison of these calculated parameters with experimental data, the conclusion was made about the correctness of the developed mathematical model.KeywordsPlasma fluid modelMagnetron sputtering systemVolt-ampere characteristic