Computer Simulation of Abnormal Glow Discharge in an Inverse Magnetron Sputtering System with Axial Plasma Flows

Abstract

Developed in NAU “Kharkiv Aviation Institute” inverse magnetron sputtering system with sectioned cathode units and axial plasma flows allows to obtain multicomponent, multilayer and functional-gradient coatings. The advantage is shown over currently used technological ion-plasma generators. It is concluded that it is necessary to develop a mathematical model that allows one to calculate the operating parameters of the sputtering system. These parameters are to be known to obtain coatings of a given composition and thickness. It is shown that to solve this problem it is necessary to develop a numerical model for calculating the distribution of local plasma parameters in the discharge gap of an inverse magnetron sputtering system with sectioned cathode units and axial plasma flows. To solve this problem, a fluid plasma model was used. The distributions of the plasma potential, electron temperature and density in the discharge gap of the investigated sputtering system were obtained. Based on comparison of these calculated parameters with experimental data, the conclusion was made about the correctness of the developed mathematical model. Noted that in order to complete the development of a mathematical model for calculation the deposition rate and composition of the coating for an inverse magnetron sputtering system with sectioned cathode units and axial plasma flows, it is necessary to develop a mathematical model for calculating the distribution of the ion current density over the surface of the target cathodes and the energy of the bombarding cathode ions.