Abstract
A 3-dimensional simulation of electron orbits is applied to a planer magnetron sputtering system with rectangular magnets. Collisions between electrons and neutral gas atoms of Ar are considered and the ionization points are assumed to approximate the distribution of sputtering plasmas. The effect of external magnetic fields on the control of the shape of magnetic fields in this calculation model is examined. By applying the external magnetic fields, the distribution of plasma density as well as the position of erosion on the target can be controlled.
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