Abstract
The fundamental characteristics of the cryogenic single-component micro-nano solid nitrogen (SN2) particle production using super adiabatic Laval nozzle and its application to the physical photo resist removal-cleaning technology are investigated by a new type of integrated measurement coupled computational technique. As a result of present computation, it is found that high-speed ultra-fine SN2 particles are continuously generated due to the freezing of liquid nitrogen (LN2) droplets induced by rapid adiabatic expansion of transonic subcooled two-phase nitrogen flow passing through the Laval nozzle. Furthermore, the effect of SN2 particle diameter, injection velocity, and attack angle to the wafer substrate on resist removal-cleaning performance is investigated in detail by integrated measurement coupled computational technique.
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