Abstract
The effect of Si diffusion in HfO2 and the presence of La on phase transformation were investigated. Tetragonal HfO2 structures exhibited high permittivity, and the addition of exotic atoms to HfO2 facilitated tetragonal phase transformation. In multi-layer (La2O3)0.08(HfO2) films, the top HfO2 layer was transformed into a perfect tetragonal structure, and the bottom HfO2 layer near the interfacial layer was of a cubic structure, after annealing at 800 °C. The permittivity reached 50–60. Si diffusion into the HfO2 film stabilized the tetragonal structure, and La incorporation into HfO2 facilitated the transition of the cubic structure.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
