Abstract
Performance of SERS substrates fabricated by nanosphere lithography (NSL), deep UV (DUV) lithography and also a commercial substrate is analyzed by studying its reproducibility, repeatability and signal enhancement capability. It was found that NSL substrate shows stronger enhancement but the intensity variation for the two prominent peaks of napthalenethiol is about 7–14% while for the DUV substrate it is less than 5%. Also, these two substrates have shown much better performance compared to the commercial substrate. The smaller variation in intensity achieved with DUV substrate is remarkable and shows the great potential of it for sensitive SERS based biosensing.
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