Abstract
Depth and distribution of implanted ions play an important role in electrical and mechanical properties of implanted surfaces. In this study nitrogen implantation at 30keV with different doses in the range of 1 × 1017–1 × 1018ions/cm2 on AISI 304 stainless steel samples has been performed. The experimental and theoretical depth profiles of nitrogen-implanted samples are investigated. Experimental depth profile using secondary ion mass spectrometry (SIMS) is compared with theoretical analysis (TRIM simulation). By considering the presence of N2+ in the implanting ion beam and sputtering effects, the TRIM and SIMS results were modified to good agreement. The proper ratio of N2+/N+ is evaluated by a curve fitting procedure.
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