Abstract
Depth and distribution of implanted ions play an important role in electrical and mechanical properties of implanted surfaces. In this study nitrogen implantation at 30keV with different doses in the range of 1 × 1017–1 × 1018ions/cm2 on AISI 304 stainless steel samples has been performed. The experimental and theoretical depth profiles of nitrogen-implanted samples are investigated. Experimental depth profile using secondary ion mass spectrometry (SIMS) is compared with theoretical analysis (TRIM simulation). By considering the presence of N2+ in the implanting ion beam and sputtering effects, the TRIM and SIMS results were modified to good agreement. The proper ratio of N2+/N+ is evaluated by a curve fitting procedure.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
