Abstract
The following five wet cleaning methods have been compared as substrate preparation for molecular beam epitaxy (MBE) (1) modified Shiraki, (2) treatment, (3) treatment, (4) RCA, and (5) dipping. The induced surface microroughness was estimated by atomic force microscopy. Residual carbon and oxygen ware evaluated by secondary ion mass spectroscopy after capping layer growth by MBE using . Microroughness induced by SPFM treatment is similar to that of others. treatment showed superior ability of carbon and oxygen removal. The oxide formed by treatment can be removed at lower substrate temperature.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
