Abstract

We present a comparative study of TiO2-based and Au catalysts for the physical vapor deposition of (Bi1−xSbx)2Se3 topological insulator nanowires. The standard Au nanoparticle catalyst was compared to five TiO2 nanoparticle based catalysts (anatase, rutile, P-25, high surface area anatase, and TiO2 supported Au particles). The use of Au nanoparticles seriously harms the properties of nanowires, thereby limiting their application. In contrast, TiO2 based catalysts lead to the residue-free growth of nanowires with a higher degree of crystallinity. Homogeneous nanowire ensembles are achieved with the mixed phase P-25 catalyst, and a possible growth mechanism is proposed.

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