Abstract
An InP based tunnel injection quantum dot (QD) laser and a reference quantum dot laser designed to emit at 1.55 μm were grown by molecular beam epitaxy. The lattice matched tunnel injection (TI) structures consist of an InGaAs quantum well (QW), an InAlGaAs barrier and multiple InAs quantum dot layers. Quantum well and quantum dot test structures as well as the actual laser structures were treated with rapid thermal annealing (RTA) at varying temperatures (680–780 °C). Photoluminescence measurements were performed at 10 K on all samples and a strong effect of this annealing process on the emission properties is observed. The laser structures were processed into broad area lasers. Power-current characteristics were measured and evaluated. A strong improvement in device performance is observed after annealing for QD lasers while for TI-QD lasers no significant improvement was obtained, which might be caused by detuning of band energy alignment and different impact of the RTA process on the material quality of QW and QD layers.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
