Abstract

A comparative study is conducted on Traditional Etchants (NaOH/H2O, KOH/H2O) and New Etchants viz. NaOH/Methanol, NaOH/Ethanol and NaOH/1-propanol for Poly(allyl diglycol carbonate) (PADC) used in Radon monitoring. Molar concentration of traditional etchants NaOH/H2O and KOH/H2O is varied from 1 M to 6 M and etching temperature is varied from 30 °C to 80 °C to verify optimal etching parameter. Etching is done for 8 to 9.5 h in the steps of 30 min. An average bulk etch rate (Vb) of 1.4μm/h and 1.7μm/h for NaOH/H2O and KOH/H2O is calculated respectively under optimal etching conditions. Optimal reported concentrations of 1.5 M, 1.5 M and 1 M respectively, are used to make standard NaOH/Methanol, NaOH/Ethanol and NaOH/1-propanol solutions. Track densities, track diameters, bulk etch rate (Vb), track etch rate (Vt), etching time, variation in mass and thickness for both traditional and new etchants are calculated and compared. Traditional etchants take much longer time (5 to 7 h) for etching with initial swelling due to absorption of etchant on the surface of detector due to broken molecular chains, causing increase in mass and thickness of detectors for initial 0.5 to 1 h of etching which are measured with digital balance (±0.0001 g) and digital micrometer (±0.001 mm) respectively. New etchants take short time for etching (30 min approx.). There is no initial increase in mass and thickness of detectors due to short etching time and high Vb of new etchant. Traditional etchants give high track densities with low Vb and Vt while new etchants gives low track density with high Vb and Vt. New tracks formation is rare in new etchants as compared to traditional etchants. An average radon concentration level of 21.8 kBqm−3 is calculated from detectors etched in traditional etchants while new etchants do not provide any useful information about radon track density to calculate radon concentration for the given samples. Trona i-e Na3H(CO3)2.2H2O is identified as a common product formed in the etched products of PADC etched in either of the etchants i.e. traditional etchants and new etchants, using X-ray powder diffraction (XRPD) analysis.

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