Comparative study of photo-induced variations of X-ray diffraction and refractive index in photo-thermo-refractive glass

Abstract

Spontaneous and photo-induced crystallization have been investigated in fluorinated silicate glass by means of X-ray diffraction and optical interferometry. This glass is a photo-sensitive material for high-efficiency phase volume hologram recording. Variations of a refractive index in this glass are controlled by UV irradiation followed by a thermal development which is photo-thermo-refractive (PTR) process. A method of discrimination of weak narrow crystalline lines from a broad diffractive pattern of a vitreous material was developed, and quantitative measurements of small concentrations of crystalline phase in glass matrix were performed. The sensitivity of the method was about 0.01 wt% of crystalline phase of NaF in a silicate glass. This crystalline phase with concentration below 0.1 wt% was detected even in a highly transparent PTR glass with a modified refractive index produced by PTR processing. A correlation between the intensity of X-ray diffraction peaks of NaF and the induced refractive index was found in equally developed PTR glass samples exposed to different dosages of UV radiation.