Comparative Studies of V1-xCrxN Films Deposited by Conventional Magnetron Sputtering and Plasma Enhanced Magnetron Sputtering

Abstract

V1-xCrxN films were deposited via conventional magnetron sputtering (CMS) and plasma enhanced magnetron sputtering (PEMS) by controlling the power of Cr target and V target. The microstructure of films was characterized using scanning electron microscope, meanwhile, the thickness was measured. The chemical composition was analyzed by an energy dispersive spectrometer, and phase structure was analyzed by X-ray diffractometer. The hardness and Young’s modulus of films were evaluated using nano-indenter. With an increase in Cr content, the deposition rate increased gradually and then reduced in both V1-xCrxN films. As Cr content increased, CMS-V1-xCrxN films transformed from a mixture of FCC-V(Cr)N and FCC-VN with non-stoichiometric ratio to a mixture of FCC-V(Cr)N and BCC-Cr, and Cr content had no effect on the phase structure of PEMS-V1-xCrxN films, all of them shown FCC-V(Cr)N. In addition, the dominant texture in V1-xCrxN films deposited by CMS and PEMS were (111) and (200). As increasing Cr content, the density of the CMS-V1-xCrxN films increased gradually, moreover, all films were loose and porous. However, the Cr content had little effect on microstructure of PEMS-V1-xCrxN films, all of which shown dense columnar structure. With the increase of Cr content, the hardness and Young’s modulus of CMS-V1-xCrxN films increased gradually and then decreased, while which in PEMS-V1-xCrxN films were rise. The doping of Cr significantly improves the structure and mechanical properties of CMS-V1-xCrxN films. Furthermore, the structure of PEMS-V1-xCrxN films is much denser, and the mechanical properties of PEMS-V1-xCrxN films are significantly better than CMS-V1-xCrxN films.