Abstract
The aim of the paper is to characterize titanium oxide films synthesized by unbalanced magnetron sputtering and metal vacuum arc deposition, as well as to test the microstructure, composition, sheet resistance and blood compatibility. With increasing oxygen inlet, the rutile TiO 2 can be synthesized in both processes. The sheet resistance of the samples increases with higher oxygen pressure and it shows a sharp increase when only rutile TiO 2 exists in the films, a similar tendency was found for pulsed vacuum arc plasma deposition and unbalanced magnetron sputtering methods. The films synthesized by the unbalanced magnetron sputtering and pulsed vacuum arc deposition sample contain the rutile phase and have a similar composition, but the microstructures like grain size and roughness are different. These will affect the semiconductivity and the surface energy, and these properties affected their blood compatibility and made their blood compatibility more different. The platelet adhesion behavior of rutile TiO 2 synthesized by unbalanced magnetron sputtering is better than the one synthesized by pulsed vacuum arc deposition.
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