Abstract
In the past 5 years there has been a large amount of work to develop CVD technology for the deposition of the predominant perovskite oxide thin films, (Ba, Sr)TiO3, SrBi2Ta2O9 and Pb(Zr, Ti)O3. For each of these families of materials, CVD processes have matured such that state-of-the-art film properties may be achieved with this technique. Much of the progress is attributed to the use of the liquid delivery technique to transfer relatively involatile metalorganic precursors to the reactor. This paper will discuss common attributes of these thermal CVD processes, particularly the precursors, delivery methodology and reactor hardware. The paper will also highlight unique aspects that differentiate the processes, including the CVD decomposition regime, strategies for film composition control and approaches for forming the crystalline perovskite phase. Representative film properties are presented, demonstrating that these processes are becoming increasingly mature.
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