Abstract
Two lithographies having different resolutions of micro and nanometer scales have been combined using a single organosilane monolayer as a resist for both. This monolayer resist was first patterned by irradiation with deep ultraviolet light through a photomask. Prior to the second patterning by scanning probe lithography, the photopatterned monolayer was observed by an atomic force microscope (AFM) in lateral force microscopy (LFM) mode. Since the photodegraded monolayer showed stronger lateral force than the unirradiated monolayer, the photogenerated pattern on the monolayer was clearly imaged. Using this LFM image, the AFM probe was aligned on the photofabricated pattern before drawing additional patterns by scanning probe lithography.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
