Abstract
A colloidal gold natural lithography technique for fabricating GaAs nanopillars was investigated. The formation of colloidal gold etch masks on GaAs substrates with an amino silane adhesion agent was studied. The fabrication of high-density sub-30 nm diameter high aspect ratio GaAs nanopillars using gold colloids as an etch mask for SiCl 4/Ar based reactive ion etching has been demonstrated. The pillars’ dimensions and profile are controlled both by the initial colloid diameter and the etching conditions. Finally, the removal of the gold colloids from the nanopillars has been achieved using wet etching.
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