Abstract
Co Cr Pt – Si O 2 films for use as thin film tape media have been investigated. Bias sputtering and high Ar pressure were utilized to achieve desirable media properties (good in-plane orientation and enhanced grain decoupling) in these media. The in-plane orientation of the bias sputtered CoCrPt–SiO2 magnetic layer was well maintained even at a high content of SiO2 as Ru was used as an underlayer and deposited at high Ar pressure. Films of (10.0) textured CoCrPt–SiO2 on a Ru underlayer showed a large in-plane coercivity of 4000Oe and transmission electron microscopy revealed an average grain size of about 10nm, well decoupled by the oxide. The in-plane coercivity was a strong function of the Ru thickness.
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