Abstract
Neuromorphic capabilities of a self-aligned complementary metal-oxide-semiconductor compatible W/WOx/HfO2/Ru cell in a 3D vertical memristive structure were investigated. We show that the device exhibits nonfilamentary forming-free multilevel resistive switching with gradual resistance change. In addition, the poor retention of a low resistance state allows integration of these structures in architectures that require short-term memory characteristics such as reservoir computing systems. The ability of the device to rely on the temporal sequence of the stream was tested with the digit recognition task. Since a WOx layer was obtained by thermal oxidization and HfO2 and Ru layers were grown by atomic layer deposition methods, the device is suitable for high-density systems with high connectivity within a neural network.
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