CMOS active pixel image sensors for highly integrated imaging systems

Abstract

A family of CMOS-based active pixel image sensors (APSs) that are inherently compatible with the integration of on-chip signal processing circuitry is reported. The image sensors were fabricated using commercially available 2-/spl mu/m CMOS processes and both p-well and n-well implementations were explored. The arrays feature random access, 5-V operation and transistor-transistor logic (TTL) compatible control signals. Methods of on-chip suppression of fixed pattern noise to less than 0.1% saturation are demonstrated. The baseline design achieved a pixel size of 40 /spl mu/m/spl times/40 /spl mu/m with 26% fill-factor. Array sizes of 28/spl times/28 elements and 128/spl times/128 elements have been fabricated and characterized. Typical output conversion gain is 3.7 /spl mu/V/e/sup -/ for the p-well devices and 6.5 /spl mu/V/e/sup -/ for the n-well devices. Input referred read noise of 28 e/sup -/ rms corresponding to a dynamic range of 76 dB was achieved. Characterization of various photogate pixel designs and a photodiode design is reported. Photoresponse variations for different pixel designs are discussed.