Abstract
On the basis of cluster-approximation quantum-chemical calculations of the interaction of an α-Al2O3 surface with oxygen, the rate coefficients for the elementary steps of the heterogeneous recombination of atomic oxygen are determined in the framework of the Eley-Rideal and Langmuir-Hinshelwood mechanisms. For the diffusion layer near the studied surface, these coefficients are used to calculate the probabilities of heterogeneous catalytic recombination, surface coverage, and heat flux to the surface at temperatures of 200–2000 K and pressures of 1000–7000 Pa. The results are compared to the results a solid-state periodic model, low-temperature plasma etching studies, and empirical models of recombination of atomic oxygen on a SiO2 surface.
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