Cliché fabrication method using precise roll printing process with 5 um pattern width

Abstract

Among the printing processes for printed electronic devices, gravure offset and reverse offset method have drawn attention for its fine pattern printing possibility. These printing methods use cliche, which has critical effect on the final product precision and quality. In this research, a novel precise cliche replica method is proposed. It consists of copper sputtering, precise mask pattern printing with 5 um width using reverse offset printing, Ni electroplating, lift-off, etching, and DLC coating. We finally compare the fabricated replica cliche with the original one and print out precise patterns using the replica cliche.