Abstract
The structure and composition of clean and Ni-adsorbed Si(110) surfaces were studied by RMEED, LEED and XPS, and the results were discussed in comparison with those recently reported by other investigators. The clean and well-oriented surface consists of an oblique “16 X 2” superstructure with dimensions: 16 times long along the 〈17,17,2〉 axis and 2 times long along the 〈112〉 axis, with double domains parallel to the 〈112〉 axis of the matrix unit cell, and with highly ordered atomic arrangement along the 〈112〉 and 〈110〉 directions. Ni-adsorbed Si(110) surfaces showed the 2 × 1 and the 4 × 5 superstructures with reversible phase transition depending on the temperature and the time of annealing. Depth profile analysis by angle-resolved XPS showed that Ni atoms contributing to these structures were mostly located at a depth of about 20 Å below the surface level, indicating that the reconstruction is closely related to the Ni content in the surface region after the heat treatment.
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