Abstract

Planar fully-depleted SOI technology with ultra-thin body and buried oxide presents a platform for an energy-efficient design in deeply scaled technologies without major changes in the bulk-CMOS design infrastructure. Good control of short-channel effects with thin transistor body offers a possibility to reduce the supply voltage. Thin buried oxide provides threshold tuning via body bias. Overall design optimality is achieved through sensitivity-based optimization by selecting optimal supplies and thresholds.

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