Abstract
The paper summarizes various recent results on chemical vapor deposition of carbon from methane in the low temperature regime around 1100 °C. The following topics are discussed: gas phase reactions, surface/deposition reactions, interactions of gas phase and surface/deposition reactions, hydrogen inhibition, influence of temperature. Based on the results a simplified reaction scheme is presented which was successfully used to simulate the influence of temperature on carbon deposition. This simulation as well as the influence of the substrate surface area/reactor volume-ratio (3rd parameter of CVD) are treated in other papers of the conference.
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