Abstract
Chemisorption of cyclopropane was investigated by measuring the extent of chemisorption on nickel film of known sufrace area, measuring the changes of electrical resistance of the film during chemisorption, and performing mass spectrometric analysis of the gas phase. It was found that during interaction of cyclopropane with nickel the CH and CC bonds are split. Some measurements of cyclopropane hydrogenation on nickel at 273 °K and under static conditions were made. Cyclopropane reacts with hydrogen in a rather complicated way as is shown by the presence of ethane in the reaction mixture. After pumping off the reaction mixture from the apparatus and admitting a starting mixture, hydrogenation on the same film proceeds with the same velocity. By poisoning nickel with oxygen before and after the first reaction, it was shown that only a small part of the surface and/or of the adsorbed layer participates in the reaction under given conditions.
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