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https://doi.org/10.1002/chin.199037339
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Cite Journal: ChemInform |  Publication Date: Sep 11, 1990 |
 Citations: 2 |
Affiliation: Stanford University
AbstractIt is demonstrated that the controllability of tensile stress in BN films prepared by plasma‐enhanced chemical vapor deposition at 400‐500 °C can be improved by introducing a small amount of carbon into the BN matrix.
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