Chemical Vapor Deposition of Single-Walled Carbon Nanotubes Using Ultrathin Ni/Al Film as Catalyst

Abstract

Chemical vapor deposition (CVD) of single-walled carbon nanotubes (SWNTs) catalyzed using a few nm thick Ni layer supported by a thin Al underlayer is reported. Analysis by transmission electron microscopy shows the SWNTs having a diameter distribution between 1.5 and 2.8 nm. The effect of the Ni/Al bilayer film thickness on the density of the SWNTs is presented. Additionally, circuits of SWNTs bridging opposing Au electrodes coated with Ni/Al catalyst films are fabricated using selective CVD. The current−voltage characteristics and circuit resistance of the nanotube circuits are also discussed.