Chemical deposition of nanostructured tungsten and tungsten-alloy coatings from gas phase

Abstract

The historical overview of the fluoride method for the low-temperature deposition of tungsten, its alloys, and compounds in Russia is presented. The physicochemical fundamentals (thermodynamics, kinetics) of the deposition process are given. The most probable rout for homogeneous and heterogeneous reactions resulting in the formation of the tungsten metal at the substrate surface is theoretically substantiated. Based on the experimental study of the initial crystallization stages, a basic mechanism of the active growth centers formation is formulated. Kinetic characteristics of the processes of tungsten codeposition with refractory transition metals, as well as the coatingsí physical-mechanical properties are given. Data on the deposition of solid tungsten-carbide films from gas phase onto low-temperature substrate are reported. Possible applications of the tungsten, tungsten alloys with transition metals, and tungsten carbide coatings are discussed.