Abstract
This study evaluated the chemical behavior of an oily byproduct which was formed in the exhaust tube during the silicon carbide epitaxial growth process using various precursors, such as silanes, chlorosilanes, propane, hydrogen chloride and hydrogen. Most of the precursors were spontaneously emitted from the oily byproduct, when the oily byproduct was kept under a nitrogen gas flow at atmospheric pressure and at room temperature. When the oily byproduct was exposed to 2-5 % chlorine trifluoride gas in ambient nitrogen at room temperature, various gaseous fluorides were produced, accompanying a slight temperature increase.
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