Abstract
In this paper, we present a charge-based compact model for transition metal dichalcogenide (TMD)-based thin-channel field-effect transistor. In model development, first, charge densities at the source and drain terminals are calculated in terms of the applied gate and drain voltages. Calculated charge densities are then used to develop a charge-based drain-current model. Effects of interface traps, ambipolar current behavior, and negative capacitance are then included in the developed drain-current model in terms of charge densities. Predictions of the proposed model are verified by the simulation and experimental data of the TMD channel material-based n-type and p-type MOSFETs.
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