Abstract
Three TiAlV lms have been prepared by vacuum arc discharge technique at di erent substrate temperatures (50, 300, and 400 ◦C). The depositions were carried out from aluminum, vanadium and titanium elemental targets. The temperature e ects on the crystalline quality and texture have been investigated by means of X-ray di raction. Two phases have been identi ed and the grain size has been found to increase with temperature. The composition of the lms has been determined by proton induced X-ray emission technique. The Ti ratio was found to increase with temperature. The microhardness, measured by the Vickers indentation method was found to decrease with temperature. X-ray photoelectron spectroscopy was used to study the chemical composition of the passive layer formed on the lms by analyzing high resolution spectra of Al 2p, Ti 2p and V 2p. This layer was mainly composed of TiO2 with a small participation of other oxidation and metallic states of Ti, Al and V.
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