Deposition of Ti6Al4V Thin Films by DC Magnetron Sputtering: Effect of the Current on Structural, Corrosion and Mechanical Properties

Abstract

Ti6Al4V films have been prepared by DC magnetron sputtering technique at different currents (600, 700, 800 and 900 mA); target–substrate distance has been 3 cm. The depositions were carried out from Ti6Al4V alloy target. The deposition rate increases with increasing the current. The current effect on the crystalline quality and texture has been investigated by means of X-ray diffraction. β-Phase has been identified, and the grain size has been found to increase with increasing the current. The composition of the films has been determined by proton-induced X-ray emission and Rutherford backscattering technique. The Ti ratio was found to increase with current. The results obtained indicate that the TiAlV films by DC magnetron sputtering can inhibit the aggressive action of corrosion media. With increasing the current to improve film quality (bigger grain size), film Ti6Al4V/SS304 improved corrosion resistance for 304 substrate; microhardness was measured using Vickers method by applying 10 g load. Ti6Al4V film improves corrosion resistance and microhardness.