Characterization of thin films, interfaces and surfaces by high-resolution electron microscopy

Abstract

Recent applications of high-resolution electron microscopy in our laboratory to the characterization of thin films, interfaces and surfaces are described. The information typically available using this technique about thin films is illustrated by studies of multiple quantum wells, metallic superlattices, magnetic films and X-ray optical elements. The problems associated with imaging interfaces are discussed by reference to silicon/silicide interfaces and grain boundaries in metals. Finally, recent observations of semiconductor surface reconstructions and beam-induced reactions at oxide surfaces are briefly summarized.