Abstract

Two sets of Al-Cu electrical contact systems have been investigated. Current-carrying Al (Cu) wire brushes were in contact with a rotating Cu (Al) slip ring in a high-vacuum (2 X 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-6</sup> torr) system which was backfilled to 1 atm of humidified CO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> . Measurements were made of 1) the electrical contact resistances of Cu brush-Al slip ring and Al brushCu slip ring systems, 2) the surface topographies of the contact faces of the brush, the slip ring wear track, and the wear particles by scanning electron microscopy (SEM), and 3) the transfer of material across the interface and to the wear particles by electron probe microanalysis (EPM). Currents up to 30-A de were used. After an initial "wear-in" the contact resistance dropped to the order of milliohms. The contact resistance of the Al brush-Cu slip ring was consistently higher than for the Cu brush-Al slip ring system. After several thousand revolutions the contact resistance began rising erratically as the slip ring surface roughened and the wear particles became larger. In both systems Al was transferred across the interface and to the wear particles. However, only in the Al brush-Cu slip ring case did Cu transfer across the interface.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.