Abstract
Silver oxide (A2O) films were deposited on glass and silicon substrates held at temperatures in the range 303–473 K by reactive RF magnetron sputtering of silver target. The films formed at room temperature were single phase Ag2O with polycrystalline in nature, while those deposited at 373 K were improved in the crystallinity. The films deposited at 423 K were mixed phase of Ag2O and Ag. Atomic force micrographs of the films formed at room temperature were of spherical shape grains with size of 85 nm, whereas those deposited at 473 K were with enhanced grain size of 215 nm with pyramidal shape. Electrical resistivity of the single phase films formed at room temperature was 5.2 × 10−3 Ωcm and that of mixed phase was 4.2 × 10−4 Ωcm. Optical band gap of single phase films increased from 2.05 to 2.13 eV with the increase of substrate temperature from 303 to 373 K, while in mixed phase films it was 1.92 eV.
Highlights
Silver-oxygen system (Ag-O) was extensively attracted by researchers due to its novel applications in high density optical storage devices, gas sensors, photovoltaic cells, photo diodes, and antibacterial coatings [1,2,3,4,5,6]
The films formed at substrate temperature of 373 K showed that the enhancement in the intensity of (111) reflection indicated the increase in the crystallinity of the Ag2O films
Silver oxide films were deposited on glass substrates by RF magnetron sputtering of pure silver target under various substrate temperatures in the range 303–473 K
Summary
Silver-oxygen system (Ag-O) was extensively attracted by researchers due to its novel applications in high density optical storage devices, gas sensors, photovoltaic cells, photo diodes, and antibacterial coatings [1,2,3,4,5,6]. This system exists in different defined compounds, namely, Ag2O, AgO, Ag3O4, Ag4O3, Ag2O3, and Ag4O4. Buchel et al [13] effectively employed silver oxide as a substrate for the surface enhanced Raman spectroscopy for molecular level detection Her et al [14] incorporated silver oxide films into super resolution near field structures in optical memories. The effect of substrate temperature on the crystallographic structure and surface morphology, core level binding energies, and electrical and optical properties was systematically studied and the results were reported
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