Abstract
Silicon-enriched layers were developed on pure nickel by hydrogen reduction of silicon tetrachloride in the temperature range 950 to 1080° C. Depending on the deposition parameters, two types of layers formed on the surface: Type I consisted of solid solution of silicon in nickel and Type II showed several phases. The latter type exhibits a stone-like surface morphology. Short-time oxidation tests conducted using a thermobalance show that the coated specimens have improved oxidation resistance compared to pure nickel.
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