Characterization of Reactive Sputtered Chromium Oxynitride Coatings Developed on Glass Substrate

Abstract

In this study, we investigate how changing the nitrogen flow rate, the length of time during deposition, and the intensity of pressure have an impact on the resulting chromium oxynitride coatings. Depending on the sputtering conditions, the X-ray diffraction analyses reveal different textures in the Cr2O3 and Cr2N phases. Films deposited with varying nitrogen flow rates and deposition durations experience compressive strains, whereas films produced with varying sputtering pressures witness tensile stresses. Film surface energies and contact angles were measured with a contact angle goniometer. Because of their hydrophobic properties, chromium oxynitride coatings may find use as water-repellent, self-cleaning surfaces. Chromium oxynitride films’ absorption and transmission curves were recorded using a UV-Vis-NIR spectrophotometer. The band gap of chromium oxynitride coatings reduces with a rise in the flow of nitrogen and sputtering time but widens with increasing deposition pressure.