Abstract
Chromium and iron nitride layers (with thicknesses of 100–1000 nm) were deposited onto silicon substrates via reactive rf magnetron sputtering. Stoichiometry, phase formation and surface morphology were analyzed by a combination of different methods: Rutherford Backscattering Spectrometry, Resonant Nuclear Reaction Analysis, Conversion Electron Mössbauer Spectroscopy, Scanning Tunneling Microscopy and X-Ray Diffraction.
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