Abstract
A method known as Particle Analysis by Mass Spectrometry (PAMS) for the chemical characterization of particles suspended in gases is described. In this method, the mass spectral measurements of individual particles are made on a continuous, real-time basis. PAMS involves a combination of the particle beam technique with mass spectrometry. A beam of particles is produced by the expansion of the gas laden with particles through a nozzle in a vacuum and is directed into the ion source of a focal plane mass spectrograph. Each particle of the beam is individually volatilized and ionized in the ion source. The resulting ions are spatially separated, according to their masses, along the focal plane and are measured with a linear array detector. The array detector enables the simultaneous measurement of all ions along the focal plane. Complete mass spectra of individual particles are obtained. PAMS has been applied for the chemical characterization of organic, inorganic, and biological particles. Individual particle composition, in addition to providing the toxic properties of particles, contain chemical signatures of their sources. PAMS can be used to detect and characterize particles in semiconductor fabrication facilities in real time and the results can be used to determine the emitting sources of these particles for their subsequent control and elimination.
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